Cho, Han-Ku: search on Z-Library

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1

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - The optical CD metrology for EUV mask

Park, Jin-Back, Hosono, Kunihiro, Bang, Kyoung-Yoon, Lee, Dong-Gun, Jeong, Hae-Young, Kim, Seung-Soo, Cho, Han-Ku

Year:

2010

Language:

english

File:

PDF, 1.10 MB

english, 2010

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

La Fontaine, Bruno M., Kim, Eun-Jin, You, Jee-Hye, Kim, Seoung-Sue, Cho, Han-Ku, Ahn, Jinho, An, Ilsin, Oh, Hye-Keun

Year:

2010

Language:

english

File:

PDF, 2.76 MB

english, 2010

3

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Plasma monitoring of chrome dry etching for mask making

Kwon, Sung-Won, Montgomery, M. Warren, Maurer, Wilhelm, Kim, Dong-Chan, Nam, Dong-Seok, Woo, Sang-Gyun, Cho, Han-Ku

Year:

2010

Language:

english

File:

PDF, 596 KB

english, 2010

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Printability and inspectability of programmed pit defects on the masks in EUV lithography

La Fontaine, Bruno M., Kang, In-Yong, Seo, Hwan-Seok, Ahn, Byung-Sup, Lee, Dong-Gun, Kim, Dongwan, Huh, Sungmin, Koh, Cha-Won, Cha, Brian, Kim, Seoung-Sue, Cho, Han-Ku, Mochi, Iacopo, Goldberg, Kennet

Year:

2010

Language:

english

File:

PDF, 2.26 MB

english, 2010

5

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Evaluation of puddle time effect and optimization of development process in 193-nm lithography

Lee, Hyung-Rae, Sturtevant, John L., Shin, Jangho, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 830 KB

english, 2004

6

Pattern Collapse Improvement in ArF Resist: Effect of Surfactant-added Rinse and Soft Bake

Jung, Myoung-Ho, Kim, Hyun-Woo, Lee, Sung-Ho, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Journal:

Journal of Photopolymer Science and Technology

Year:

2003

File:

PDF, 627 KB

2003

7

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Era of double exposure in 70 nm node DRAM cell

Kim, Sang-Jin, Smith, Bruce W., Park, Joon-Soo, Kim, Tae-Young, Kim, Byeong-Soo, Yeo, Gi-Sung, Oh, Seok-Hwan, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Year:

2005

Language:

english

File:

PDF, 3.10 MB

english, 2005

8

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Comprehensive analysis of sources of total CD variation in ArF resist perspective

Kim, Hyun-Woo, Sturtevant, John L., Lee, Hyung-Rae, Kim, Kyung-Mee, Lee, Shi Yong, Kim, Bong-Cheol, Oh, Seok-Hwan, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 2.32 MB

english, 2004

9

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication

Jung, Myoung-Ho, Sturtevant, John L., Kim, Hyun-Woo, Hong, Jin, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 2.66 MB

english, 2004

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Patterning with EUVL: the road to 22nm node

La Fontaine, Bruno M., Kim, Hyun-Woo, Na, Hai-Sub, Cho, Kyoung-Yong, Park, Chang-Min, Yasue, Takahiro, Mayya, Subramanya, Cho, Han-Ku

Year:

2010

Language:

english

File:

PDF, 2.28 MB

english, 2010

11

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Top barrier coating materials for immersion lithography and beyond

Hata, Mitsuhiro, Lin, Qinghuang, Yoon, Jin-Young, Hah, Jung-Hwan, Ryoo, Man-Hyoung, Choi, Sang-Jun, Cho, Han-Ku

Year:

2006

Language:

english

File:

PDF, 780 KB

english, 2006

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

Cho, In Wook, Park, Joon-Min, Kim, Hyunsu, Hong, Joo-Yoo, Kim, Seong-Sue, Cho, Han-Ku, Oh, Hye-Keun, Henderson, Clifford L.

Year:

2009

Language:

english

File:

PDF, 933 KB

english, 2009

13

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Lee, Ji-Young, Shin, Jangho, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae, Sturtevant, John L.

Year:

2004

Language:

english

File:

PDF, 174 KB

english, 2004

14

A New Method for Line Width Roughness Mitigation

Mayya, K. Subramanya, Yool, Kang, Kim, Hochul, Cho, Han-Ku

Journal:

Japanese Journal of Applied Physics

Year:

2011

Language:

english

File:

PDF, 1.15 MB

english, 2011

15

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Chalykh, Roman, Silver, Richard M., Kim, Seong-Sue, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Year:

2005

Language:

english

File:

PDF, 229 KB

english, 2005

16

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Realization of sub-80-nm small-space patterning in ArF photolithography

Kim, Si-Hyun, Sturtevant, John L., Kim, Hyung-Do, Lee, Si-Hyeung, Park, Chang-Min, Ryoo, Man-Hyoung, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae

Year:

2004

Language:

english

File:

PDF, 595 KB

english, 2004

17

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Novel chemical shrinkage material for small contact hole and small space patterning

Hata, Mitsuhiro, Sturtevant, John L., Hah, Jung-Hwan, Kim, Hyun-Woo, Ryoo, Man-Hyoung, Woo, Sang-Gyun, Cho, Han-Ku

Year:

2005

Language:

english

File:

PDF, 613 KB

english, 2005

18

New types of dose distributions for vertical sidewall minimizing total dose in 3-D electron-beam proximity effect correction of nanoscale features

Dai, Qing, Lee, Soo-Young, Lee, Sang-Hee, Kim, Byung-Gook, Cho, Han-Ku

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2012

Language:

english

File:

PDF, 2.06 MB

english, 2012

19

[Japan Soc. of Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (29-31 Oct. 2003)] Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Quantitative evaluation of grid size effect on CD uniformity improvement

Doo-Youl Lee,, Sung-Woo Lee,, Gi-Sung Yeo,, Jung-Hyeon Lee,, Han-Ku Cho,, Woo-Sung Han,

Year:

2003

Language:

english

File:

PDF, 102 KB

english, 2003

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Design for Manufacturability through Design-Process Integration II - Predicting conversion time of circuit design file by artificial neural networks

Jang, Sung-Hoon, Singh, Vivek K., Rieger, Michael L., Lee, Jee-Hyong, Ahn, Byoung-Sup, Ki, Won-Tai, Choi, Ji-Hyeon, Woo, Sang-Gyun, Cho, Han-Ku

Year:

2008

Language:

english

File:

PDF, 1003 KB

english, 2008

21

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - A method for generating assist-features in full-chip scale and its application to contact layers of sub-70nm DRAM devices

Park, Dong-Woon, Flagello, Donis G., Kim, Sangwook, Hwang, Chan, Lee, Sukjoo, Cho, Han-Ku, Moon, Joo-Tae

Year:

2007

Language:

english

File:

PDF, 284 KB

english, 2007

22

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Modified procedure for evaluation of low-k1 process windows

Park, Dong-Woon, Smith, Bruce W., Lee, Sook, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 191 KB

english, 2004

23

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Comparison of ArF bilayer resists for sub-90 nm L/S fabrication

Hong, Jin, Kim, Hyun-Woo, Lee, Sung-Ho, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 969 KB

english, 2003

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Incident angle change caused by different off-axis illumination in extreme ultraviolet lithography

Kim, Eun-Jin, Schellenberg, Frank M., La Fontaine, Bruno M., You, Jee-Hye, Kim, Seong-Sue, Cho, Han-Ku, An, Ilsin, Oh, Hye-Keun

Year:

2009

Language:

english

File:

PDF, 887 KB

english, 2009

25

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Process latitude extension in low k 1 DRAM lithography using specific layer-oriented illumination design

Kang, Young S., Yen, Anthony, Nam, Dong-Seok, Hwang, Chan, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Year:

2003

Language:

english

File:

PDF, 718 KB

english, 2003

26

Which Mask is Preferred for Sub-60 nm Node Imaging?

Kim, Sung-Hyuck, Kim, Soon-Ho, Kim, Yong-Hoon, Lee, Jeung-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 543 KB

english, 2007

27

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Study for compensation of unexpected image placement error caused by VSB mask writer deflector

Lee, Hyun-joo, Abboud, Frank E., Faure, Thomas B., Choi, Min-kyu, Moon, Seong-yong, Cho, Han-Ku, Doh, Jonggul, Ahn, Jinho

Year:

2012

Language:

english

File:

PDF, 958 KB

english, 2012

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Seo, Hwan-Seok, Schellenberg, Frank M., La Fontaine, Bruno M., Lee, Dong-Gun, Ahn, Byung-Sup, Han, Hakseung, Huh, Sungmin, Kang, In-Yong, Kim, Hoon, Kim, Dongwan, Kim, Seong-Sue, Cho, Han-Ku

Year:

2009

Language:

english

File:

PDF, 4.83 MB

english, 2009

29

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Assessments on process parameters' influences to the proximity correction

Lee, Eun-Mi, Silver, Richard M., Lee, Sung-Woo, Lee, Doo-Youl, Choi, Soo-Han, Park, Joo-On, Jung, Sung-Gon, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 126 KB

english, 2004

30

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Investigation on polarization monitoring mask: pattern design and experimental verification

Hwang, Chan, Archie, Chas N., Park, Dong-Woon, Shin, Jang-Ho, Nam, Dong-Seok, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Year:

2006

Language:

english

File:

PDF, 171 KB

english, 2006

31

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Mask process monitoring with optical CD measurements for sub-50-nm

Bang, Kyung-Yoon, Kawahira, Hiroichi, Zurbrick, Larry S., Park, Jin-Back, Roh, Jeong-Hun, Chung, Dong-Hoon, Cho, Sung-Yong, Kim, Yong-Hoon, Woo, Sang-Gyun, Cho, Han-Ku

Year:

2008

Language:

english

File:

PDF, 210 KB

english, 2008

32

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Optical performance enhancement technique for 45-nm node with binary mask

Jung, Jin-Sik, Watanabe, Hidehiro, Kim, Hee-Bom, Lee, Jeung-Woo, Woo, Sang-Gyun, Cho, Han-Ku

Year:

2007

Language:

english

File:

PDF, 583 KB

english, 2007

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Printability and inspectability of defects on the EUV mask for sub-32nm half pitch HVM application

Huh, Sungmin, La Fontaine, Bruno M., Naulleau, Patrick P., Kang, In-Yong, Kim, Sang-Hyun, Seo, Hwan-seok, Kim, Dongwan, Park, Jooon, Kim, Seong-Sue, Cho, Han-Ku, Goldberg, Kenneth, Mochi, Iacopo, Shok

Year:

2011

Language:

english

File:

PDF, 3.38 MB

english, 2011

34

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Requirement of in-field illumination control for low k1 imaging below 0.3

Hwang, Chan, Smith, Bruce W., Shin, Jangho, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae

Year:

2005

Language:

english

File:

PDF, 157 KB

english, 2005

35

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Strategy for sub-80-nm contact hole patterning considering device fabrication

Yoon, Jin-Young, Sturtevant, John L., Hata, Mitsuhiro, Hah, Jung-Hwan, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 389 KB

english, 2004

36

ArF Bi-layer Resist for sub-90nm L/S Fabrication

Kim, Hyun-Woo, Hong, J., Jung, Myung-Ho, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung

Journal:

Journal of Photopolymer Science and Technology

Year:

2003

File:

PDF, 1.67 MB

2003

37

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - ArF issues of 90-nm-node DRAM device integration

Goo, Doo-Hoon, Kim, Byeong-Soo, Park, Joon-Soo, Yoon, Kwang-Sub, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae, Yen, Anthony

Year:

2003

Language:

english

File:

PDF, 679 KB

english, 2003

38

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Defect printability and defect inspection simulations of patterned EUVL mask using rigorous coupled-wave analysis

Kim, Seong-Sue, Mackay, R. Scott, Chalyck, Roman, Woo, Sang-Gyun, Cho, Han-Ku

Year:

2005

Language:

english

File:

PDF, 117 KB

english, 2005

39

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Kim, Sang-Wook, Smith, Bruce W., Lee, Sung-Woo, Park, Chang-Min, Choi, Soo-Han, Lee, Young-Mi, Kang, Yool, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung

Year:

2004

Language:

english

File:

PDF, 815 KB

english, 2004

40

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Shot based MRC flow by using full chip MRC tool

Ji, Min-Kyu, Watanabe, Hidehiro, Jang, Sung-Hoon, Son, Sung-Jun, Choi, Ji-Hyeun, Woo, Sang-Gyun, Cho, Han-Ku

Year:

2007

Language:

english

File:

PDF, 522 KB

english, 2007

41

Etching characteristics and modeling for oval-shaped contact

Sung-Chan Park, Seok-Hyun Lim, Chul-Ho Shin, Gyung-Jin Min, Chang-Jin Kang, Han-Ku Cho, Joo-Tae Moon

Journal:

Thin Solid Films

Year:

2007

Language:

english

File:

PDF, 913 KB

english, 2007

42

Double-Patterning Technique Using Plasma Treatment of Photoresist

Lee, Doo-Youl, Kang, Yool, Chae, Yun-Sook, Lee, Suk-Joo, Cho, Han-Ku, Moon, Joo-Tae

Journal:

Japanese Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 373 KB

english, 2007

43

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Improvement of pattern collapse in sub-100 nm nodes

Jung, Myoung-Ho, Lee, Sung-Ho, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 83 KB

english, 2003

44

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Distributed processing (DP) based e-beam lithography simulation with long range correction algorithm in e-beam machine

Ki, Won-Tai, Horiuchi, Toshiyuki, Choi, Ji-Hyeon, Kim, Byung-Gook, Woo, Sang-Gyun, Cho, Han-Ku

Year:

2008

Language:

english

File:

PDF, 407 KB

english, 2008

45

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Overlay metrology for dark hard mask process: simulation and experiment study

Shin, Jangho, Archie, Chas N., Chalykh, Roman, Kang, Hyunjae, Kim, SeongSue, Lee, SukJoo, Cho, Han-Ku

Year:

2007

Language:

english

File:

PDF, 652 KB

english, 2007

46

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Simulation of critical dimension and profile metrology based on scatterometry method

Chalykh, Roman, Martin, Patrick M., Naber, Robert J., Pundaleva, Irina, Kim, SeongSue, Cho, Han-Ku, Moon, Joo-Tae

Year:

2006

Language:

english

File:

PDF, 397 KB

english, 2006

47

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Most feasible curing process for ArF resists in device integration aspect

Kim, Hyun-Woo, Kang, Yool, Lee, Ju-Hyung, Chae, Yun-Sook, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 1.31 MB

english, 2003

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Line edge and width roughness dependency on each ingredient of extreme ultraviolet molecular resist

Kim, Hyunsu, Henderson, Clifford L., Cho, In Wook, Kim, Seong-Sue, Cho, Han-Ku, Oh, Hye-Keun

Year:

2009

Language:

english

File:

PDF, 1.02 MB

english, 2009

49

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - What an antishrinkage coating method can surmount among stumbling block of ArF resists

Kim, Hyung-Do, Fedynyshyn, Theodore H., Lee, Si-Hyeung, Choi, Sang-Jun, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae

Year:

2003

Language:

english

File:

PDF, 466 KB

english, 2003

50

SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Development and evaluation of new MRC parameter for aggressive mask optimization

Shim, Seong-bo, Chen, Alek C., Han, Woo-Sung, Kim, Young-chang, Jang, Seong-hoon, Lin, Burn J., Yen, Anthony, Kim, Hee-bom, Lee, Sung-woo, Choi, Seong-woon, Cho, Han-ku, Park, Chan-hoon

Year:

2009

Language:

english

File:

PDF, 413 KB

english, 2009

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